Applied Angstrom Technology
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  • Atomic Layer Etching
  • Gas Delivery System
  • Remote Plasma Source
  • Plasma-in-liquid Coating
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Applied Angstrom Technology
Home
PRODUCT & TECHNOLOGY
  • Atomic Layer Etching
  • Gas Delivery System
  • Remote Plasma Source
  • Plasma-in-liquid Coating
About Us
  • Background
  • Location & Headquarter
News & Events
Career
More
  • Home
  • PRODUCT & TECHNOLOGY
    • Atomic Layer Etching
    • Gas Delivery System
    • Remote Plasma Source
    • Plasma-in-liquid Coating
  • About Us
    • Background
    • Location & Headquarter
  • News & Events
  • Career
  • Home
  • PRODUCT & TECHNOLOGY
    • Atomic Layer Etching
    • Gas Delivery System
    • Remote Plasma Source
    • Plasma-in-liquid Coating
  • About Us
    • Background
    • Location & Headquarter
  • News & Events
  • Career
What is ALE?

Atomic Layer Etching

  • A plasma-assisted layer-by-layer dry etching process
  • Each ALE cycle includes four steps: 
    • Dose: the material surface is chemically modified with reactive gas
    • Purge: the excess gas molecules are purged
    • Etch: the modified layer is removed by low energy plasma
    • Purge: the removal byproduct are purged

Two Classes of ALE

Anisotropic

Anisotropic

Anisotropic

Anisotropic etching removes material preferentially in a specific direction. The etch rate varies with the orientation, typically favoring vertical over horizontal etching.

Isotropic

Anisotropic

Anisotropic

Isotropic etching removes material uniformly in all directions. This means that the etch rate is the same regardless of the orientation.

Applied Angstrom Technology

Blk 81 Ayer Rajah Crescent, #03-41, Singapore 139967

Contact us: +6562619166

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